Available for Licensing: Fluorescent Tracer Technology for Hydrofluoric Acid Exposure Detection

Technology Licensing Opportunity: This technology is available for licensing through Idaho National Laboratory's (INL) Technology Deployment office. INL is not seeking to procure products or services in connection with this technology, and no procurement activity is associated with INL's technology transfer process. Interested parties are invited to contact INL to discuss licensing terms and partnership opportunities. Overview Hydrofluoric acid (HF) is used across petroleum refining, semiconductor manufacturing, glass processing, pharmaceutical synthesis, mineral processing, and laboratory research, among others. Despite established handling protocols, accidental skin or surface contact remains a persistent hazard — compounded by HF's unusual toxicological profile: at low concentrations, early-stage contact produces no pain, burning, or visible irritation, while damage to subcutaneous tissue and bone progresses silently before symptoms appear. This technology introduces a UV-fluorescent tracer additive created froma xanthene powder.. The additive is designed to remain chemically inert while enabling workers to survey skin, clothing, or surfaces using a UV light source after handling. Fluorescence indicates contact, supporting immediate decontamination and first aid before acid penetrates tissue. The approach is intended as a complementary detection layer alongside existing personal protective equipment and engineering controls. Industry Need Current HF safety practice relies on prevention: chemical-resistant PPE, engineered containment, and procedural controls. These measures reduce exposure frequency but do not eliminate the risk of accidental contact, particularly in production environments or during equipment maintenance. No field-deployable method currently exists for workers to confirm the absence of skin or surface contact after an HF-handling task. The standard indicator of exposure is symptom onset, which may occur hours after contact, after significant phys